Ion implantation apparatus

Details Ion implantation apparatus Ion implantation apparatus

1996-03-28

1997-06-24

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25044211, H01J 3720, H01J 37317

Patent

active

056419694

ABSTRACT:
Ion implantation apparatus has an implant wheel in a vacuum chamber. The implant wheel has a number of circumferentially distributed wafer holding positions and is arranged to spin so that the wafers successively intercept an ion beam. The implant wheel is mounted at the free end of a scanning arm which itself is mounted for reciprocating movement on a wall of the vacuum chamber by means of a rotary vacuum seal. A wheel drive motor is mounted in the vacuum chamber on the rotational axis of the implant wheel and the wheel and drive motor combination can be tilted at the end of the scanning arm to adjust the angle of implantation. The tilt actuator is inside the vacuum chamber mounted on the scanning arm and the tilt axis is such that the axis of rotation of the implant wheel remains always in the same plane as the axis of scan of the scanning arm.

REFERENCES:
patent: 4733091 (1988-03-01), Robinson et al.
patent: 4899059 (1990-02-01), Freytsis et al.
patent: 5525807 (1996-06-01), Hirokawa et al.

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