Optics: measuring and testing – For light transmission or absorption
Reexamination Certificate
2006-01-24
2006-01-24
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
For light transmission or absorption
C356S445000
Reexamination Certificate
active
06989899
ABSTRACT:
A method for simultaneously monitoring ion implantation dose, damage and/or dopant depth profiles in ion-implanted semiconductors includes a calibration step where the photo-modulated reflectance of a known damage profile is identified in I-Q space. In a following measurement step, the photo-modulated reflectance of a subject is empirically measured to obtain in-phase and quadrature values. The in-phase and quadrature values are then compared, in I-Q space, to the known damage profile to characterize the damage profile of the subject.
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Nicolaides Lena
Opsal Jon
Salnik Alex
Merlino Amanda
Stallman & Pollock LLP
Therma-Wave, Inc.
Toatley , Jr. Gregory J.
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