Ion generating apparatus for semiconductor manufacturing equipme

Radiant energy – Ion generation – Electron bombardment type

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250423R, 250424, H01J 3708

Patent

active

059733292

ABSTRACT:
An ion generating apparatus for semiconductor fabricating equipment includes a device for reversing the orientation of a magnetic field. In this manner, the potential energy of a plurality of filaments in the ion generating apparatus are maintained at a substantially equal level, and consequently, asymmetric damage to one of the plurality of filaments due to concentration and collision of the thermal electrons is prevented, thereby prolonging the maintenance cycle of the ion generating apparatus.

REFERENCES:
patent: 5189303 (1993-02-01), Tanjyo et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ion generating apparatus for semiconductor manufacturing equipme does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion generating apparatus for semiconductor manufacturing equipme, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion generating apparatus for semiconductor manufacturing equipme will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-767429

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.