Ion beam treating apparatus

Details Ion beam treating apparatus Ion beam treating apparatus

1986-06-20

1988-03-22

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

2504922, G21K 508, G01F 2100

Patent

active

047330872

ABSTRACT:
A tilting mechanism tilts the wafer holding portions for wafers in any direction with respect to the direction of ion beams emitted from an ion source. The tilting mechanism is comprised of a linking mechanism for transmitting the rotation of the receiving plates to the wafer holding portions, tilted links for tilting the wafer holding portions, and a shaft being coupled to the tilted links and moving in the rotary disc. The wafer holding portions provide spherical portions, and the spherical portions are inserted in the receiving plates. A pin of the preceiving plates is fitted into the groove of the wafer holding portion. The distances between the ion source and the respective wafers are maintained equal. The ion beam irradiates uniformly the respective wafers and treats uniformly the respective wafers.

REFERENCES:
patent: 3240934 (1966-03-01), Watanabe et al.
patent: 3435210 (1969-03-01), Valdre
patent: 3629577 (1971-12-01), Weber
patent: 3920233 (1975-11-01), Stuckert
patent: 4128765 (1978-12-01), Franks
patent: 4405864 (1983-09-01), del Rio
patent: 4627009 (1986-12-01), Holmes

Affiliated with

Also associated with

Rating

Ion beam treating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion beam treating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion beam treating apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-443641