Ion beam neutral detection

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S251000, C250S492200, C250S397000

Reexamination Certificate

active

11056445

ABSTRACT:
An ion beam neutral detector system, an ion implanter system including the detector system and a method of detecting ion beam neutrals that ensures an ion implant is meeting contamination requirements are disclosed. The detector includes an energy contamination monitor positioned with in an ion implanter system. A method of the invention includes implanting the workpiece using an ion beam, and periodically detecting ion beam neutrals in the ion beam such that adjustments to the ion implanter system can be made for optimization.

REFERENCES:
patent: 5543615 (1996-08-01), Saito et al.
patent: 5631461 (1997-05-01), Swenson
patent: 5811823 (1998-09-01), Blake et al.
patent: 5814823 (1998-09-01), Benveniste
patent: 5883391 (1999-03-01), Adibi et al.
patent: 6207958 (2001-03-01), Giakos

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ion beam neutral detection does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion beam neutral detection, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion beam neutral detection will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3811669

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.