Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1992-01-14
1993-06-01
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511121, 31511131, 31511181, 31323131, 3133591, 250423R, H01J 2716
Patent
active
052163300
ABSTRACT:
The present invention discloses an ion beam gun wherein the ions are produced by radio-frequency excitation. A plasma is created in a vessel, or chamber, by ionizing gas molecules by means of a coil about the outside of the vessel. The coil receives radio-frequency energy which ionizes the gas molecules. The inside of the vessel contains an anode and resonator to assist in shaping and containing the plasma. The resonator acts as an internal electrode to produce eddy currents generated by the radio-frequency energy to enhance the plasma. A multi-apertured screen grid also helps contain and shape the plasma within the chamber while a multi-apertured accelerator grid is used to extract the ions from the ion beam gun.
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Brochure, "The RF-Ion Source Pris 10 with the RF-Induction Coil Placed Inside the Discharge Plasma", by J. Freisinger, J. Krempel-Hesse, J. Krumeich, H. Lob, W. D. Munz, and A. Scharmann, Published by Hauzer Techno Coating, Publication date unknown.
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Champion Ronald E.
Honeywell Inc.
LaRoche Eugene R.
Yoo Do Hyun
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