Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Reexamination Certificate
2006-10-24
2006-10-24
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
C427S526000, C427S533000, C427S534000, C427S162000, C118S718000, C118S728000, C118S733000
Reexamination Certificate
active
07125587
ABSTRACT:
A system and method to expose a material to an ion beam during a continuous material production process may include a vacuum fixture to form the ion beam and a slit in the fixture to allow at least a portion of the ion beam to exit the fixture through the slit. The material can be placed in contact with an exterior area of the fixture so as to cover the slit. With the material in place, the vacuum within the fixture may be maintained and the ion beam formed. The material over the slit can be exposed to the ion beam. As the continuous process moves material past the slit, the vacuum within the vacuum fixture may help to maintain the material in contact with the fixture.
REFERENCES:
patent: 4622918 (1986-11-01), Bok
patent: 4655168 (1987-04-01), Shimozato et al.
patent: 4681780 (1987-07-01), Kamman
patent: 4692233 (1987-09-01), Casey
patent: 4885070 (1989-12-01), Campbell et al.
patent: 5116461 (1992-05-01), Lebby et al.
patent: 5203924 (1993-04-01), Mitani et al.
patent: 5389195 (1995-02-01), Ouderkirk et al.
patent: 5770826 (1998-06-01), Chaudhari et al.
patent: 6458285 (2002-10-01), Iyama et al.
patent: 6475571 (2002-11-01), Echigo et al.
patent: 6602559 (2003-08-01), Honda et al.
patent: 6724963 (2004-04-01), Neuberger
patent: 2002/0063055 (2002-05-01), Katoh et al.
patent: 2002/0076161 (2002-06-01), Hirabayashi et al.
patent: 2003/0210371 (2003-11-01), Chaudhari et al.
patent: 8-313912 (1996-11-01), None
patent: 10-54988 (1998-02-01), None
patent: 2005-189788 (2005-07-01), None
patent: WO 92/06486 (1982-04-01), None
Padgett Marianne
Varian Semiconductor Equipment Associates Inc.
LandOfFree
Ion beam for enhancing optical properties of materials does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ion beam for enhancing optical properties of materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion beam for enhancing optical properties of materials will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3646758