Ion beam control system

Details Ion beam control system Ion beam control system

1990-03-01

1991-06-11

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

25649221, 256423R, H01J 3730

Patent

active

050234587

ABSTRACT:
An ion implantation source used in an ion implantation system. The source produces multiple beam portions which combine to form a large diameter beam of the size of a workpiece. By controlling beam neutralization of the individual beam portions the ion density as a function of position within the cross-section of the beam can be controlled.

REFERENCES:
patent: 3717785 (1973-02-01), Guernet
patent: 3795833 (1974-03-01), King et al.
patent: 4522657 (1985-06-01), Rohatgi et al.
patent: 4578589 (1986-03-01), Aitken
patent: 4724328 (1988-02-01), Lischke

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