Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2007-07-24
2007-07-24
Chen, Shih-Chao (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111810
Reexamination Certificate
active
10541915
ABSTRACT:
The invention relates to an ion accelerator arrangement which uses a combination of a magnetic field having a cusp structure and a cross-section of an ionisation chamber that is extended in one direction transversally in relation to the longitudinal axis. This enables the ionic current to be advantageously scaled.
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Coustou Gregory
Koch Norbert
Kornfeld Günter
A Minh Dieu
Chen Shih-Chao
Thales Electron Devices GmbH
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