Inverted isolation formed with spacers

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S506000

Reexamination Certificate

active

06891229

ABSTRACT:
A method of forming a semiconductor device so as to provide the device inverted isolation trenches with convex sidewalls. Initially, a plurality of composite isolation posts (50, 51) are formed on a substrate (40) through successive deposition, lithography, and etching steps. The posts comprise a bottom layer (501, 502) of silicon dioxide and an overlying etch-stop layer of silicon nitride (502, 512). An insulating material (60) is then deposited over the isolation posts and areas of the substrate. Isolation structures (70,71) are established by etching the insulating material to form convex sidewall spacers (701,702, 711, 712) at the vertical walls of the isolation posts. Active areas (80) between spacers are filled with semiconductor material. In an embodiment, a strained cap layer (101) may be imposed on the active areas. The strained cap layer has a lattice constant that is different from the lattice constant of the semiconductor material.

REFERENCES:
patent: 5498567 (1996-03-01), Klose et al.
patent: 5849077 (1998-12-01), Kenney
patent: 5960270 (1999-09-01), Misra et al.
patent: 6010930 (2000-01-01), Keller et al.
patent: 6060385 (2000-05-01), Givens
patent: 6207517 (2001-03-01), Muller
patent: 6207577 (2001-03-01), Wang et al.
patent: 6362071 (2002-03-01), Nguyen et al.
patent: 6475916 (2002-11-01), Lee et al.
patent: 6664195 (2003-12-01), Jang et al.
patent: 6686630 (2004-02-01), Hanafi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Inverted isolation formed with spacers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inverted isolation formed with spacers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inverted isolation formed with spacers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3401357

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.