Introducing nanotubes in trenches and structures formed thereby

Coating processes – Frictional application

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S475000, C977S720000

Reexamination Certificate

active

07666465

ABSTRACT:
Methods of forming a microelectronic structure are described. Embodiments of those methods include providing a substrate comprising at least one opening, and then applying a nanotube slurry comprising at least one nanotube to the substrate, wherein the at least one nanotube is substantially placed within the at least one opening.

REFERENCES:
patent: 6887450 (2005-05-01), Chen et al.
patent: 2006/0123628 (2006-06-01), Horiuchi et al.
patent: 2006/0138658 (2006-06-01), Ravi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Introducing nanotubes in trenches and structures formed thereby does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Introducing nanotubes in trenches and structures formed thereby, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Introducing nanotubes in trenches and structures formed thereby will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4153666

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.