Interrupted developing process for a photoresist image

Details Interrupted developing process for a photoresist image Interrupted developing process for a photoresist image

1990-08-29

1993-06-29

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

430322, 430325, 430396, G03F 730

Patent

active

052233774

ABSTRACT:
A process of developing a photoresist by contacting the photoresist with a developer is improved by subjecting the photoresist to heat prior to completion of the development process.

REFERENCES:
patent: 4423137 (1983-12-01), Rester
patent: 4573782 (1986-03-01), Kobayashi et al.
patent: 4610952 (1986-09-01), Crivello
patent: 4675273 (1987-06-01), Woods et al.
patent: 4695527 (1987-09-01), Geissler et al.
Moreau et al., "Contrast and Sensitivity Enhancement of Resists for High Resolution", J. Vac. Sci Technol. B, vol. 6, 2238, Nov./Dec. 1988.

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