Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2008-07-22
2008-07-22
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C430S005000, C430S022000
Reexamination Certificate
active
07404173
ABSTRACT:
Intermediate resolution-enhancement state layouts are generated based upon an original non-resolution enhanced layout of an integrated circuit and an associated resolution-enhanced layout. The intermediate resolution-enhancement state layout includes fragments corresponding to parts of the original layout and biases associated with the fragments, where the biases indicate distances between the fragments and the resolution-enhanced layout. The fragments are also assigned attributes such as fragment type, fragment location, and biases. The intermediate resolution-enhancement state layouts can be combined to generate the layout for a full chip IC. Two or more intermediate resolution-enhancement state layouts are assembled and are locally reconverged to adjust the resolution enhancement associated with the intermediate resolution-enhancement state layouts and obtain the intermediate resolution-enhancement state layouts for the full IC.
REFERENCES:
patent: 5900340 (1999-05-01), Reich et al.
patent: 6044007 (2000-03-01), Capodieci
patent: 6370679 (2002-04-01), Chang et al.
patent: 6492066 (2002-12-01), Capodieci et al.
patent: 6516459 (2003-02-01), Sahouria
patent: 2002/0100004 (2002-07-01), Pierrat et al.
patent: 2003/0110460 (2003-06-01), Pierrat et al.
patent: 2004/0006756 (2004-01-01), Zhang
patent: WO 00/67074 (2000-11-01), None
patent: WO 01/84239 (2001-11-01), None
PCT International Search Report and Written Opinion, PCT/US05/10267, Nov. 22, 2006, 7 pages.
Supplementary European Search Report, European Patent Application No. 05729870.5, Dec. 28, 2007, 6 Pages.
Hung Meg
Tang Hongbo
Wang Xin
Wu Shao-Po
Aprio Technologies, Inc.
Dinh Paul
Fenwick & West LLP
LandOfFree
Intermediate layout for resolution enhancement in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Intermediate layout for resolution enhancement in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Intermediate layout for resolution enhancement in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2771625