Interconnector with contact pads having enhanced durability

Electrical connectors – Preformed panel circuit arrangement – e.g. – pcb – icm – dip,... – With provision to conduct electricity from panel circuit to...

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439 91, 439 71, H01R 909

Patent

active

058106073

ABSTRACT:
A structure of an enhanced durability interconnector to reliably interconnect modules having high density type contacts, such as found in modules having solder ball connections (SBC), to a connecting article such as a printed circuit board. The structure comprising a means to provide the SBC type contact a mating surface having a wide contact area. Furthermore, the electrical connecting medium within the interconnector, which is embedded in an elastomeric material to provide compliance, is strengthened by using two or more embedded wires in combination for each wide contact area contact. The interconnector is incorporated into a fixture to compress the interconnector between the SBC module and the connecting article. The fixture having further capability to align the connections, control the compression pressure and to prevent over-compression.

REFERENCES:
patent: 2961746 (1960-11-01), Lyman
patent: 3430338 (1969-03-01), Flaherty
patent: 3541222 (1970-11-01), Parks et al.
patent: 3557446 (1971-01-01), Charschan
patent: 3795037 (1974-03-01), Luttmer
patent: 3862790 (1975-01-01), Davies et al.
patent: 3889363 (1975-06-01), Davies
patent: 3954317 (1976-05-01), Gilissen et al.
patent: 4003621 (1977-01-01), Lamp
patent: 4008300 (1977-02-01), Ponn
patent: 4295700 (1981-10-01), Sado
patent: 4329780 (1982-05-01), Somers
patent: 4355199 (1982-10-01), Luc
patent: 4402562 (1983-09-01), Sado
patent: 4408814 (1983-10-01), Takashi et al.
patent: 4509099 (1985-04-01), Takamatsu et al.
patent: 4520562 (1985-06-01), Sado et al.
patent: 4548451 (1985-10-01), Benarr et al.
patent: 4555523 (1985-11-01), Hall et al.
patent: 4575166 (1986-03-01), Kasdagly et al.
patent: 4577918 (1986-03-01), Kasdagly
patent: 4778950 (1988-10-01), Lee et al.
patent: 4793814 (1988-12-01), Zifcak et al.
patent: 4820170 (1989-04-01), Redmond et al.
patent: 4820376 (1989-04-01), Lambert et al.
patent: 4832609 (1989-05-01), Chung
patent: 4991290 (1991-02-01), MacKay
patent: 4998885 (1991-03-01), Beaman
patent: 5037312 (1991-08-01), Casciotti et al.
patent: 5049084 (1991-09-01), Bakke
patent: 5099309 (1992-03-01), Kryzaniwsky
patent: 5371654 (1994-12-01), Beaman et al.
patent: 5413489 (1995-05-01), Switky
patent: 5518410 (1996-05-01), Masami
patent: 5611696 (1997-03-01), Donner et al.
"Shaped Elastomeric Interposer for Large Area Array Connectors", Disclosed Anonymously, Research Disclosure, Apr. 1991, No. 324, K. Mason Publications, Ltd., England.
"Elastomeric Interposer Using Wires in Elastomer Pad with Controlled Compliance" Disclosed Anonymounsly, Research Disclosure, Apr. 1991, No. 324,K. Mason Pub.Ltd.Eng.
"Elastomeric Interposer Using Film-Supported Metal Conductors" Disclosed Anonymously--Research Disclosure, Apr. 1991, No. 324, K. Mason Publications, Ltd., England.
"High Density Area Array Connector" Disclosed Anonymously, Research Disclosure, Apr. 1991, No. 324, K. Mason Publications Ltd., England.

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