Interconnect structure with polygon cell structures

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including dielectric isolation means

Reexamination Certificate

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C257S758000, C257S760000, C257SE21573

Reexamination Certificate

active

11237356

ABSTRACT:
Interconnect structures with polygonal cell structures. An exemplary interconnect structure comprises a substrate and a first dielectric layer, overlying the substrate and exposing a conductive feature formed therethrough and connected with the substrate, wherein the first dielectric layer includes a plurality of polygon cell structures with hollow interior.

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