Computer-aided design and analysis of circuits and semiconductor – Integrated circuit design processing – Physical design processing
Reexamination Certificate
2008-05-29
2011-11-08
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Integrated circuit design processing
Physical design processing
C716S054000, C716S055000, C716S112000, C716S126000, C257S767000, C438S618000
Reexamination Certificate
active
08056039
ABSTRACT:
An interconnect structure for an integrated circuit (IC) device includes an elongated, electrically conductive line comprising one or more segments formed at a first width, w1, and one or more segments formed at one or more additional widths, w2. . . wN, with the first width being narrower than each of the one or more additional widths; wherein the relationship of the total length, L1, of the one or more conductive segments formed at the first width to the total lengths, L2. . . LN, of the one or more conductive segments formed at the one or more additional widths is selected such that, for a given magnitude of current carried by the conductive line, a critical length with respect to an electromigration short-length effect benefit is maintained such that a total length of the conductive line, L=L1+L2+ . . . +LN, meets a minimum desired design length regardless of the critical length.
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Chanda Kaushik
Filippi Ronald
Grunow Stephan
Hu Chao-Kun
Sankaran Sujatha
Brown Katherine
Cantor & Colburn LLP
Do Thuan
International Business Machines - Corporation
Nguyen Nha
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