Intensity selective exposure method and apparatus

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S005000

Reexamination Certificate

active

08003303

ABSTRACT:
A gradated photomask is provided. The photomask includes a first region including a first plurality of sub-resolution features and a second region including a second plurality of sub-resolution features. The first region blocks a first percentage of the incident radiation. The second region blocks a second percentage of the incident radiation. The first and second percentage are different. An intensity selective exposure method is also provided.

REFERENCES:
patent: 5821013 (1998-10-01), Miller et al.
patent: 6093507 (2000-07-01), Tzu
patent: 2009/0101906 (2009-04-01), Hosoya et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Intensity selective exposure method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Intensity selective exposure method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Intensity selective exposure method and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2792267

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.