Intensity selective exposure method and apparatus

Details Intensity selective exposure method and apparatus Intensity selective exposure method and apparatus

2011-08-23

2011-08-23

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000

Reexamination Certificate

active

08003303

ABSTRACT:
A gradated photomask is provided. The photomask includes a first region including a first plurality of sub-resolution features and a second region including a second plurality of sub-resolution features. The first region blocks a first percentage of the incident radiation. The second region blocks a second percentage of the incident radiation. The first and second percentage are different. An intensity selective exposure method is also provided.

REFERENCES:
patent: 5821013 (1998-10-01), Miller et al.
patent: 6093507 (2000-07-01), Tzu
patent: 2009/0101906 (2009-04-01), Hosoya et al.

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