Intelligent supervision system with expert system for ion implan

Details Intelligent supervision system with expert system for ion implan Intelligent supervision system with expert system for ion implan

1997-03-17

1999-01-12

Anderson, Bruce

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25049222, H01J 37304

Patent

active

058594370

ABSTRACT:
An intelligent supervision system on the ion beam map during ion implantation process includes an ion implanter for introducing ions into a wafer, a feature extractor for receiving a beam current signal and a display blanking signal from the ion implanter to extract features of the beam current signal; a fuzzification subsystem for justifying confidence level on the features; and an expert system for recognizing symptoms of abnormal scanning and providing an indication thereof to a human operator. The expert system also provides an indication of appropriate corrective action, which an operator then uses to adjust the implantation process. Alternatively, the expert system may be configured to provide control signals directly to the ion implanter to adjust the implantation process without the need for an operator.

REFERENCES:
patent: 4785188 (1988-11-01), Mori et al.
patent: 4849641 (1989-07-01), Berkowitz
patent: 4951190 (1990-08-01), Lane et al.
patent: 4967380 (1990-10-01), Szajnowski
patent: 4980562 (1990-12-01), Berrian et al.
patent: 5198676 (1993-03-01), Benveniste et al.
patent: 5278420 (1994-01-01), Sugiyama
patent: 5711843 (1998-01-01), Jahns

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