Integration of pore sealing liner into dual-damascene...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S653000, C438S687000

Reexamination Certificate

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11286877

ABSTRACT:
A device employs damascene layers with a pore sealing liner and includes a semiconductor body. A metal interconnect layer comprising a metal interconnect is formed over the semiconductor body. A dielectric layer is formed over the metal interconnect layer. A conductive trench feature and a conductive via feature are formed in the dielectric layer. A pore sealing liner is formed only along sidewall of the conductive via feature and along sidewalls and bottom surfaces of the conductive trench feature. The pore sealing liner is not substantially present along a bottom surface of the conductive via feature.

REFERENCES:
patent: 6893985 (2005-05-01), Goodner
patent: 6909195 (2005-06-01), Li et al.
patent: 6917108 (2005-07-01), Fitzsimmons et al.
patent: 2004/0147117 (2004-07-01), Ngo et al.
patent: 2005/0133920 (2005-06-01), Liou et al.
patent: 2005/0239278 (2005-10-01), Li et al.
patent: 2006/0216932 (2006-09-01), Kumar et al.
patent: 2006/0244152 (2006-11-01), Abell
patent: 2007/0004230 (2007-01-01), Johnston et al.
patent: 2007/0007654 (2007-01-01), Man
patent: 2007/0080461 (2007-04-01), Lu et al.
U.S. Appl. No. 10/903,597, filed Jul. 29, 2004, Papa Rao et al., Entire Document.

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