Integrated trim structure utilizing dynamic doping

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S380000

Reexamination Certificate

active

06940133

ABSTRACT:
An integrated circuit trim structure includes a dopant source, a target trim element formed in proximity to the dopant source, and a conductive heating element. The heater element is formed in proximity to the dopant source and includes first and second terminals and a trapezoid shaped region formed between the first and second terminals. As predefined current pulse is applied to the first terminal to promote current flow between the first and second terminals, a local heat source is created at a predefined location within the trapezoid shaped region and in proximity to the dopant source such that dopant flows from the dopant source into the target trim element to change the conductive characteristics of the target trim element.

REFERENCES:
patent: 5293058 (1994-03-01), Tsividis
patent: 5391906 (1995-02-01), Natsume
patent: 2004/0239477 (2004-12-01), Landsberger et al.

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