Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2003-11-25
2008-10-28
Turner, Samuel A (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
07443511
ABSTRACT:
A lithographic interferometer system includes a beam generating mechanism, mirrors which reflect those beams, and detection devices configured to detect an interference pattern of overlapping reflected beams. The beam generating mechanism includes a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.
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Beems Marcel Hendrikus Maria
Eussen Emiel Jozef Melanie
Van Der Pasch Engelbertus Antonius Fransiscus
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Turner Samuel A
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