Metal working – Barrier layer or semiconductor device making
Patent
1996-12-24
1998-08-18
Graybill, David
Metal working
Barrier layer or semiconductor device making
438 61, 438907, H01L 2168, B65G 4907
Patent
active
057953554
ABSTRACT:
An integrated wafer loader is provided for use with a vacuum process chamber. At least one semipermeable membrane provided in the separator between upper and lower chambers of a load lock permits air flow while preventing particulate matter transfer. A micro-environment container is sealed within the upper chamber and a vacuum simultaneously produced in both upper and lower chambers. A movable carrier plate opens the micro-environment container and removes a cassette of wafers from therein and into the lower chamber. The micro-environment container remains supported by the separator and forms an impermeable barrier between the chambers. Wafers are transferred from the cassette to the process environment, and returned to the cassette after processing has been completed. The carrier plate returns the cassette containing the processed wafers to the micro-environment container for removal from the load lock chamber.
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patent: 5340384 (1994-08-01), Sims
Applied Materials Inc.
Glenn Michael A.
Graybill David
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