Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-10-26
2010-02-02
Chen, Kin-Chan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S714000, C216S067000
Reexamination Certificate
active
07655571
ABSTRACT:
A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
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Hoogensen Brett Christian
Kawaguchi Mark Naoshi
Kim Steven M.
Lo Kin Pong
Wen Sandy M.
Applied Materials Inc.
Chen Kin-Chan
Patterson & Sheridan LLP
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