Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1998-05-28
2000-08-22
Tran, Andrew
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438613, 438614, 438615, 438108, 438118, 438459, H01L 2144
Patent
active
06107179&
ABSTRACT:
A method of creating a plurality of fine pitch integrated interconnects utilizes a flexible layer to create a plurality of integrated interconnects which extend beyond the boundary of the integrated circuit chip onto the substrate. Subsequently, a support layer is deposited on the interconnects and the substrate under the plurality of interconnects which is located beyond the boundary of the integrated circuit chip is removed.
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Mojarradi Mohammad M.
Wong Kaiser H.
Zomorrodi Mehrdad
Rad Fariba
Tran Andrew
Wilson Christian D.
Xerox Corporation
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