Integrated fabrication method of forming connectors through insu

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156643, 156657, 156659, 156662, 156901, 96 362, 427 96, 427 99, 427259, 29625, 204192E, 204192EC, H01L 21312, B44C 122

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active

040765750

ABSTRACT:
In integrated circuit fabrication, a method is provided for forming metallic connectors through a layer of electrically insulative material. The method comprises forming a layer of electrically insulative material on a substrate and then forming a mask of photoresist material having a plurality of openings through which said insulative layer is exposed on said insulative layer. Then, the exposed portions of said insulative layer are removed by etching to form openings through which the underlying substrate is exposed, after which a first metal layer is deposited over the masked substrate. This metal layer is thinner than the insulative layer so that the openings in the insulative layer are only filled part way up with metal. Then, the photoresist mask is removed thereby removing the metal layer deposited on it to leave only the metal in the insulative layer openings. Next, a second layer of metal is deposited over the first insulative layer and over the remaining metal in said openings, after which portions of the second metal layer over the insulative layer are removed to form a metallization pattern which is continuous with the metal in said openings.

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patent: 3451867 (1969-06-01), Taft
patent: 3597834 (1971-08-01), Lathrop
patent: 3633269 (1972-01-01), Bachmeier
patent: 3697318 (1972-10-01), Feinberg
patent: 3714521 (1973-01-01), Shaw
patent: 3831068 (1974-08-01), Kniepkamp
patent: 3837907 (1974-09-01), Berglund
patent: 3877051 (1975-04-01), Calhoun

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