Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1998-01-20
1999-07-27
Saadat, Mahshid
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257356, 257360, 257173, 257546, H01L 2362, H01L 2900
Patent
active
059294914
ABSTRACT:
A parasitic field effect transistor or a parasitic diode is formed in an integrated circuit. The parasitic element is formed by two doped regions of the same or opposite conductivity type and an insulating region therebetween. The doped regions are each connected to a respective terminal pad of the integrated circuit. To increase the ESD strength, the length of the insulating region in the lateral direction is greater than or equal to a length of the longest discharge path of the ESD protection structures connected to the terminal pads.
REFERENCES:
patent: 5293057 (1994-03-01), Ho et al.
patent: 5426323 (1995-06-01), Reczek et al.
patent: 5449939 (1995-09-01), Horiguchi et al.
patent: 5698886 (1997-12-01), Thenoz et al.
patent: 5705841 (1998-01-01), Yu
Hebbeker Heinz
Reczek Werner
Savignac Dominique
Terletzki Hartmud
Fenty Jesse A.
Greenberg Laurence A.
Lerner Herbert L.
Saadat Mahshid
Siemens Aktiengesellschaft
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