Integrated circuit structure having two photoresist layers

Details Integrated circuit structure having two photoresist layers Integrated circuit structure having two photoresist layers

1995-05-16

1999-02-09

Letscher, Geraldine

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430 9, 430 11, 430 12, 430 16, 430313, 430318, 430311, 430312, 430329, 430333, G03C 500

Patent

active

058691758

ABSTRACT:
A structure formed during processing of an integrated circuit. Two layers of photoresist are formed over a conductive layer to be patterned. The lower layer is thinner than the upper layer, and is dyed to have a lower transmittance. Both layers are used as a masking pattern for the underlying conductive layer.

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Keller, Solid State Technology, "Functional Testing of Positive Photoresist for Manufacture of Film Integrated Circuits", Jun. 1987, pp. 45-53.
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Listvan et al., SPIE, "Multiple Layer Techniques in Optical Lithography: Applications to Fine Line Mos Production", vol. 470, 1984, pp. 85-90.

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