Integrated circuit screen arrangement and a method for its manuf

Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold – Field relief electrode

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257288, 257505, 257532, 257538, 257539, 257565, H01L 2940, H01L 2702, H01L 2904

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active

051967235

ABSTRACT:
An integrated semiconductor circuit includes a substrate, an epitaxial layer having transistor base regions, a first and a second (11) insulating oxide layer, and a protective layer. The first oxide layer carries heavily doped polycrystalline layers, including an electric contact layer, a screening layer and a connecting layer. The connecting layer electrically connects the screening layer to the epitaxial layer, through the electric contact layer. The screening layer prevents the occurrence of inversion and parasite components in the epitaxial layer between the base regions. The polycrystalline layer arrangement is simple and can be produced in a common process step. The arrangement is able to withstand high temperatures and enables the second insulating layer to be readily applied.

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patent: 4430663 (1984-02-01), D'Altroy et al.
patent: 4613886 (1986-09-01), Chwang
patent: 4764800 (1988-08-01), Sander
Relation Between Oxide Thickness and the Breakdown Voltage of a Planar Junction with Field Relief Electrode, V. P. O'Neil & P. G. Alonas, IEEE Trans. on Electron Devices, vol. ED-26, pp. 1098-1100, Jul. 1979.
An Advanced Processing Technology for High Voltage Bipolar IC's M. Roche, Revue De Physique Appliquee, Tome 13, pp. 845-850, Dec. 1978.
"The Design and Electrical Characteristic of High-Performance Single-Poly Ion-Implanted Bipolar Transistors", Denny Duan-Lee Tang et al., IEEE Transactions on Electron Devices, vol. 36, pp. 1703-1710, Sep. 1989.

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