Integrated circuit photomask

Details Integrated circuit photomask Integrated circuit photomask

1981-12-30

1983-10-25

Hess, Bruce H.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428203, 428209, 428210, 428212, 428216, 428218, 428432, 428433, 428689, 428702, 430396, B32B 300, B32B 700, G03F 700

Patent

active

044119720

ABSTRACT:
A photomask formed of a transparent dielectric substrate, such as glass and quartz based substrates, having a conductive surface adjacent region, which is patterned with sequential overcoatings of a composite chrome oxide layer and a chrome film. The mask comprises a combination of varied reflectivities to provide proper densities for the opaque areas of the mask.

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IBM TDB "Grounding Scheme", N. S. Viswanathan, vol. 17, No. 7, 12/74, p. 1954.
IBM TDB "Multilayer Antireflective Absorption Mask", W. J. Stetson, vol. 18, No. 5, Oct. 1975, p. 1319.
IBM TDB, "Mask Substrate Surface Shields", R. S. Horwath et al., vol. 15, No. 6, Nov. 1972, p. 1727.
IBM TDB, "Structure for reduction of E-Beam Charging on Multilevel Metal Structures", J. S. Logan et al., vol. 24, No. 6, Nov. 1981, pp. 3037-3038.

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