Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1986-09-02
1988-06-07
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430316, 430317, 430325, 430326, 430394, 437946, G03C 500
Patent
active
047496401
ABSTRACT:
A process is disclosed for manufacturing an integrated circuit in which multiple patterned layers of thin film materials are provided on a silicon wafer. The wafer is conditioned between the providing of layers, after each etching step, by rinsing the item with a purified water solution containing at least 0.01 ppm ozone, preferably between 0.02 and 0.09 ppm ozone.
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Ackermann Arthur J.
Tremont Peter L.
Arrowhead Industrial Water, Inc.
Dees Jos,e G.
Gerstman George H.
Kittle John E.
Monsanto Company
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