Inductor devices – Interlinked coils or windings
Reexamination Certificate
2005-02-01
2005-02-01
Nguyen, Viet Q. (Department: 2818)
Inductor devices
Interlinked coils or windings
C336S186000, C336S083000, C336S08400R, C336S098000, C336S147000, C029S604000
Reexamination Certificate
active
06850141
ABSTRACT:
The invention relates to an inductor comprising a plurality of interconnected conductive segments interwoven with a substrate. The inductance of the inductor is increased through the use of coatings and films of ferromagnetic materials such as magnetic metals, alloys, and oxides. The inductor is compatible with integrated circuit manufacturing techniques and eliminates the need in many systems and circuits for large off chip inductors. A sense and measurement coil, which is fabricated on the same substrate as the inductor, provides the capability to measure the magnetic field or flux produced by the inductor. This on chip measurement capability supplies information that permits circuit engineers to design and fabricate on chip inductors to very tight tolerances.
REFERENCES:
patent: 3553533 (1971-01-01), Haberecht
patent: 3561110 (1971-02-01), Feulner et al.
patent: 3614554 (1971-10-01), Richardson et al.
patent: 3731005 (1973-05-01), Shearman
patent: 3881244 (1975-05-01), Kendall
patent: 3988764 (1976-10-01), Cline et al.
patent: 4024565 (1977-05-01), Anthony et al.
patent: 4729510 (1988-03-01), Landis
patent: 4839659 (1989-06-01), Stern et al.
patent: 4845452 (1989-07-01), Sasaki et al.
patent: 5095357 (1992-03-01), Andoh et al.
patent: 5177670 (1993-01-01), Shinohara et al.
patent: 5227659 (1993-07-01), Hubbard
patent: 5336921 (1994-08-01), Sundaram et al.
patent: 5450755 (1995-09-01), Saito et al.
patent: 5479695 (1996-01-01), Grader et al.
patent: 5696471 (1997-12-01), Fujiwara
patent: 5767563 (1998-06-01), Imam et al.
patent: 5875452 (1999-02-01), Katayama et al.
patent: 6069397 (2000-05-01), Cornett et al.
patent: 6240622 (2001-06-01), Ahn et al.
patent: 6249039 (2001-06-01), Harvey et al.
patent: 6291872 (2001-09-01), Wang et al.
patent: 6303971 (2001-10-01), Rhee
patent: 6357107 (2002-03-01), Ahn et al.
patent: 6446327 (2002-09-01), Ahn et al.
patent: 6459135 (2002-10-01), Basteres et al.
patent: 6531945 (2003-03-01), Ahn et al.
patent: 6542060 (2003-04-01), Fedeli
patent: 6548365 (2003-04-01), Basteres et al.
patent: 6573822 (2003-06-01), Ma et al.
patent: 6612019 (2003-09-01), Ahn et al.
patent: 6696912 (2004-02-01), Ahn et al.
patent: 20010016976 (2001-08-01), Ahn et al.
patent: 20010018794 (2001-09-01), Ahn et al.
patent: 20010022019 (2001-09-01), Ahn et al.
patent: 20010023530 (2001-09-01), Ahn et al.
patent: 20020095773 (2002-07-01), Ahn et al.
patent: 20020095777 (2002-07-01), Ahn et al.
patent: 403286512 (1991-12-01), None
patent: 406089976 (1994-03-01), None
patent: 06-120036 (1994-04-01), None
patent: 411251143 (1999-09-01), None
patent: 2000-269059 (2000-09-01), None
Ahn, Chong H., et al., “A Fully Integrated Planar Toroidal Inductor with a Micromachined Nickel-Iron Magnetic Bar,”IEEE Transactions on Components, Packaging, and Manufacturing Technology, Part A -vol. 17, No. 3,(Sept. 1994),pp. 463-469.
Iron code powders,Applications of Surface Science, 22/23, North-Holland, Amsterdam, (1985), pp. 621-630.
Dimitrov, D. V., et al., “Stoichiometry and Magnetic Properties of Iron Oxide Films”,Materials Research Society Symposium Proceedings, 494, (1998), pp. 89-94.
Fujii, E, et al., “Low-temperature preparation and properties of spinel-type iron oxide films by ECR plasma-enhanced metalorganic chemical vapor deposition”,Japanese Journal of Applied Physics, 32(10B), (Oct. 1993),pp. 1527-1529.
Ouchi, H.., et al., “High rate deposition of iron-oxide thin films by reactive sputtering”,IEEE Transactions on Magnetics, vol. MAG-19, No. 5, (Sep. 1983), pp. 1980-1962.
Soh, H.T., et al., “Ultra-Low Resistance, Through-Wafer Via (TWV) Technology and its Applications in Three Dimensional Structures on Silicon”,Japanese Journal of Applied Physics, 38(4B), (Apr. 1999),pp. 284-286.
Park, J.Y., et al., “Ferrite-Based Integrated Planar Inductor and Transformers Fabricated at Low Temperature”,IEEE Transactions on Magnetics, 33(5), (Sep. 1997),pp. 3322-3324.
Park, J.Y., et al., “Fully Integrated Micromachined Inductors with Electroplated Anisotropic Magnetic Cores”,Thirteenth Annual Applied Power Electronics Conference and Exposition, vol. 1, Conference Proceedings, Anaheim, California, (1998),379-385.
Macchesney, J.B., et al., “Chemical vapor deposition of iron oxide films for use as semitransparent masks”,Journal of Electrochemical Society, 118(5), (May 1971),pp. 776-781.
Li, J.L., et al., “Preparation of amorphous iron-containing and crystalline iron oxide films by glow discharge and their properties”,Material Science & Engineering, B7, (Sep. 1990), pp. 6-13.
Lin, J.K., et al., “Properties of RF Sputtered Iron Oxide Thin Films With CoCr and Nb as Dopants”IEEE Transactions on Magnetics, 21(5), (Sep. 1985),pp. 1462-1464.
Domke, M., et al., “Magnetic and electronic properties of thin iron oxide films”,Surface Science, 126, (Mar. 1983), pp. 727-732.
Ouyang, M., et al., “Structure and Magnetic Properties of Iron Oxide Films Deposited by Excimer Laser Ablation of a Metal-Containing Polymer”Material Research Bulletin, 32(8), (1997),pp. 1099-1107.
Dhara, S. et al., “Direct Deposit of highly coercive gamma iron oxide thin films for magnetic recording”,Journal of Applied Physics, 74(11), (Dec. 1993),pp. 7019-7021.
Joshi, S., et al., “Pulsed laser deposition of iron oxide and ferrite films”,Journal of Applied Physics, 64(10), Abstract -Fourth Joint Magnetism and Magnetic Materials -INTERMAG Conference Vancouver, BC,(Nov.) (1988),pp. 5647-5649.
Shigematsu, T... et al., “Magnetic properties of amorphous iron (III) oxide thin films”Journal de Physique Colloque, International Conference on the Applications of the Mossbauer Effect, Kyoto, Japan, Mar. 1979),pp. 153-154.
Itoh, T.., et al., “Ferrite plating of Ba-containing iron oxide films using chelated highly alkaline (pH equals 11-13) aqueous solutions”,Japanese Journal of Applied Physics, 34(3), (Mar. 1995),pp. 1534-1536.
Zheng, Y.., et al., “Structure and magnetic properties of sputtered iron oxide films”,Proceedings of the International Symposium on Physics of Magnetic Materials, (1987),pp. 146-149.
Kim, Y. J.., et al., “Surface Micromachined Solenoid Inductors for High Frequency Applications,”1997 International Symposium on Micrelectronics, (1997),1-6.
Ahn Kie Y.
Forbes Leonard
Nguyen Viet Q.
Schwegman Lundberg Woessner & Kluth P.A.
LandOfFree
Integrated circuit inductors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Integrated circuit inductors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated circuit inductors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3498193