Integrated circuit inductors

Details Integrated circuit inductors Integrated circuit inductors

2008-06-17

2008-06-17

Mai, Anh T (Department: 2832)

Inductor devices

Coil or coil turn supports or spacers

Printed circuit-type coil

C336S223000, C336S232000

Reexamination Certificate

active

07388462

ABSTRACT:
The invention relates to an inductor comprising a plurality of interconnected conductive segments interwoven with a substrate. The inductance of the inductor is increased through the use of coatings and films of ferromagnetic materials such as magnetic metals, alloys, and oxides. The inductor is compatible with integrated circuit manufacturing techniques and eliminates the need in many systems and circuits for large off chip inductors. A sense and measurement coil, which is fabricated on the same substrate as the inductor, provides the capability to measure the magnetic field or flux produced by the inductor. This on chip measurement capability supplies information that permits circuit engineers to design and fabricate on chip inductors to very tight tolerances.

REFERENCES:
patent: 3553533 (1971-01-01), Haberecht
patent: 3561110 (1971-02-01), Feulner et al.
patent: 3614554 (1971-10-01), Richardson et al.
patent: 3659240 (1972-04-01), Learned et al.
patent: 3691497 (1972-09-01), Bailey et al.
patent: 3731005 (1973-05-01), Shearman
patent: 3881244 (1975-05-01), Kendall
patent: 3988764 (1976-10-01), Cline et al.
patent: 3996095 (1976-12-01), Ahn et al.
patent: 4024565 (1977-05-01), Anthony et al.
patent: 4560445 (1985-12-01), Hoover et al.
patent: 4626947 (1986-12-01), Narishige et al.
patent: 4729510 (1988-03-01), Landis
patent: 4839659 (1989-06-01), Stern et al.
patent: 4845452 (1989-07-01), Sasaki et al.
patent: 5047719 (1991-09-01), Johnson et al.
patent: 5095357 (1992-03-01), Andoh et al.
patent: 5157569 (1992-10-01), Kumasaka et al.
patent: 5177670 (1993-01-01), Shinohara et al.
patent: 5227659 (1993-07-01), Hubbard
patent: 5336921 (1994-08-01), Sundaram et al.
patent: 5425166 (1995-06-01), Hastings et al.
patent: 5448822 (1995-09-01), Wu et al.
patent: 5450755 (1995-09-01), Saito et al.
patent: 5479695 (1996-01-01), Grader et al.
patent: 5534837 (1996-07-01), Brandt
patent: 5576680 (1996-11-01), Ling
patent: 5629553 (1997-05-01), Ikeda et al.
patent: 5629838 (1997-05-01), Knight et al.
patent: 5670415 (1997-09-01), Rust
patent: 5696471 (1997-12-01), Fujiwara
patent: 5767563 (1998-06-01), Imam et al.
patent: 5801521 (1998-09-01), Mizoguchi et al.
patent: 5802702 (1998-09-01), Fleming et al.
patent: 5804422 (1998-09-01), Shimizu et al.
patent: 5837392 (1998-11-01), Katori et al.
patent: 5875452 (1999-02-01), Katayama et al.
patent: 5898991 (1999-05-01), Fogel et al.
patent: 5956073 (1999-09-01), Jin et al.
patent: 6013939 (2000-01-01), El-Sharawy et al.
patent: 6031273 (2000-02-01), Torok et al.
patent: 6054750 (2000-04-01), Imam et al.
patent: 6060976 (2000-05-01), Yamaguchi et al.
patent: 6069397 (2000-05-01), Cornett et al.
patent: 6094123 (2000-07-01), Roy
patent: 6116863 (2000-09-01), Ahn et al.
patent: 6148500 (2000-11-01), Krone et al.
patent: 6191468 (2001-02-01), Forbes et al.
patent: 6239683 (2001-05-01), Roessler et al.
patent: 6240622 (2001-06-01), Ahn et al.
patent: 6249039 (2001-06-01), Harvey et al.
patent: 6291872 (2001-09-01), Wang et al.
patent: 6303971 (2001-10-01), Rhee
patent: 6346865 (2002-02-01), Callewaert et al.
patent: 6356181 (2002-03-01), Kitamura
patent: 6357107 (2002-03-01), Ahn et al.
patent: 6362012 (2002-03-01), Chi et al.
patent: 6373368 (2002-04-01), Shikama et al.
patent: 6406988 (2002-06-01), Chung
patent: 6417754 (2002-07-01), Bernhardt et al.
patent: 6420954 (2002-07-01), Ahn et al.
patent: 6446327 (2002-09-01), Ahn et al.
patent: 6459135 (2002-10-01), Basteres et al.
patent: 6459352 (2002-10-01), Liu et al.
patent: 6531945 (2003-03-01), Ahn et al.
patent: 6538547 (2003-03-01), Tamezawa et al.
patent: 6542060 (2003-04-01), Fedeli
patent: 6548365 (2003-04-01), Basteres et al.
patent: 6573822 (2003-06-01), Ma et al.
patent: 6612019 (2003-09-01), Ahm et al.
patent: 6614093 (2003-09-01), Ott et al.
patent: 6671135 (2003-12-01), Sasaki et al.
patent: 6696912 (2004-02-01), Ahn et al.
patent: 6760967 (2004-07-01), Ahn et al.
patent: 6794965 (2004-09-01), Shen et al.
patent: 6817087 (2004-11-01), Ahn et al.
patent: 6822545 (2004-11-01), Ahn et al.
patent: 6825747 (2004-11-01), Ahn et al.
patent: 6976300 (2005-12-01), Ahn et al.
patent: 7158004 (2007-01-01), Ahn et al.
patent: 2001/0016976 (2001-08-01), Ahn et al.
patent: 2001/0018794 (2001-09-01), Ahn et al.
patent: 2001/0022019 (2001-09-01), Ahn et al.
patent: 2001/0023530 (2001-09-01), Ahn et al.
patent: 2002/0095770 (2002-07-01), Ahn et al.
patent: 2002/0095773 (2002-07-01), Ahn et al.
patent: 2002/0095777 (2002-07-01), Ahn et al.
patent: 59-232403 (1984-12-01), None
patent: 403286512 (1991-12-01), None
patent: 06089811 (1994-03-01), None
patent: 406089976 (1994-03-01), None
patent: 06-120036 (1994-04-01), None
patent: 07-272932 (1995-10-01), None
patent: 09-092539 (1997-04-01), None
patent: 11-251147 (1999-09-01), None
patent: 411251143 (1999-09-01), None
patent: 2000-269059 (2000-09-01), None
Kaito, C..,et al. , “Structure of iron oxide films prepared by evaporating various iron oxide powders”,Applicatons of Surface Science, 22/23, North-Holland, Amsterdam,(1985),pp. 621-630, no month.
Dimitrov, D..V. ,et al. , “Stoichiometry and Magnetic Properties of Iron Oxide Films”,Materials Research Society Symposium Proceedings, 494, (1998),pp. 89-94.
Fujii, E.,et al. , “Low-temperature preparation and properties of spinel-type iron oxide films by ECR plasma-enhanced metalorganic chemical vapor deposition”,Japanese Journal of Applied Physics, 32(10B), (Oct. 1993),pp. 1527-1529.
Ouchi, H..,et al. ,“High rate deposition of iron-oxide thin films by reactive sputtering”,IEEE Transactions on Magnetics, Vol. MAG-19, No. 5, (Sep. 1983),pp. 1980-1982.
Soh, H..T. ,et al. ,“Ultra-Low Resistance, Through-Wafer Via (TWV) Technology and its Applications in Three Dimensional Structures on Silicon”,Japanese Journal of Applied Physics, 38(4B), (Apr. 1999),pp. 284-285.
Park, J..Y. ,et al. ,“Ferrite-Based Integrated Planar Inductor and Transformers Fabricated at Low Temperature”,IEEE Transactions on Magnetics, 33(5), (Sep. 1997),pp. 3322-3324.
Park, J..Y. ,et al. ,“Fully Integrated Micromachined Inductors with Electroplated Anisotropic Magnetic Cores”,Thirteenth Annual Applied Power Electronics Conference and Exposition, vol. 1, Conference Proceedings, Anaheim, California,(1998),379-385, no month.
MacChesney, J..B. ,et al. ,“Chemical vapor deposition of iron oxide films for use as semitransparent masks”,Journal of the Electrochemical Society, 118(5), (May 1971),pp. 776-781.
Li, J..L. ,et al. ,“Preparation of amorphous iron-containing and crystalline iron oxide films by glow discharge and their properties”,Material Science&Engineering, B7, (Sep. 1990),pp. 5-13.
Lin, J..K. ,et al. ,“Properties of RF Sputtered Iron Oxide Thin Films With CoCr and Nb as Dopants”,IEEE Transactions on Magnetics, 21(5), (Sep. 1985),pp. 1462-1464.
Domke, M..,et al. ,“Magnetic and electronic properties of thin iron oxide films”,Surface Science, 126, (Mar. 1983),pp. 727-732.
Ouyang, M..,et al. ,“Structure and Magnetic Properties of Iron Oxide Films Deposited by Excimer Laser Ablation of a Metal-Containing Polymer”,Material Research Bulletin, 32(8), (1997),pp. 1099-1107, no month.
Dhara, S.,et al. , “Direct Deposit of highly coercive gamma iron oxide thin films for magnetic recording”,Journal of Applied Physics, 74(11), (Dec. 1993),pp. 7019-7021.
Joshi, S..,et al. , “Pulsed laser deposition of iron oxide and ferrite fims”,Journal of Applied Physics, 64 (10), Abstract—Fourth Joint Magnetism and Magnetic Materials—INTERMAG Conference Vancouver, BC,(Nov. 1988),pp. 5647-5649.
Shigematsu, T..,et al. ,“Magnetic properties of amorphous iron (III) oxide thin films”,Journal de Physique Colloque, International Conference on the Applications of the Mossbauer Effect, Kyoto, Japan,(Mar. 1979),pp. 153-154.
Itoh, T..,et al. ,“Ferrite plating of Ba-containing iron oxide films using chelated highly alkaline (pH equals 11-13) aque

Affiliated with

Also associated with

Rating

Integrated circuit inductors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated circuit inductors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated circuit inductors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2805277