Integrated circuit including a gate electrode

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S343000, C257SE27084, C257SE21646

Reexamination Certificate

active

07829892

ABSTRACT:
An integrated circuit including a gate electrode is disclosed. One embodiment provides a transistor including a first source/drain electrode and a second source/drain electrode. A channel is arranged between the first and the second source/drain electrode in a semiconductor substrate. A gate electrode is arranged adjacent the channel layer and is electrically insulated from the channel layer. A semiconductor substrate electrode is provided on a rear side. The gate electrode encloses the channel layer at least two opposite sides.

REFERENCES:
patent: 5437762 (1995-08-01), Ochiai et al.
patent: 5466961 (1995-11-01), Kikuchi et al.
patent: 5598037 (1997-01-01), Kikuchi et al.
patent: 5918115 (1999-06-01), Kikuchi et al.
patent: 6433609 (2002-08-01), Voldman
patent: 2005/0029583 (2005-02-01), Popp et al.
Chenming Hu, “SOI and nanoscale MOSFETs”, Device Research Conference, Jun. 25-27, 2001, pp. 3-4.
Tai-su Park et al., “A 40 nm body-tied FinFED (OMEGA MOSFET) using bulk Si wafer”, Physica E 19 (2003) pp. 6-12, www.elsevier.com/locate/physe.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Integrated circuit including a gate electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated circuit including a gate electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated circuit including a gate electrode will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4241542

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.