Integrated circuit contact system

Details Integrated circuit contact system Integrated circuit contact system

2011-08-09

2011-08-09

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S629000, C438S643000, C438S653000, C438S656000, C257SE23175, C257SE23152

Reexamination Certificate

active

07994047

ABSTRACT:
An integrated circuit contact system is provided including forming a contact plug in a dielectric and forming a first barrier layer in a trench in the dielectric and on the contact plug. Further, the system includes removing a portion of the first barrier layer from the bottom of the first barrier layer and depositing the portion of the first barrier layer on the sidewall of the first barrier layer, and forming a second barrier layer over the first barrier layer and filling a corner area of the trench.

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