Integrated circuit chips with fine-line metal and...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S760000, C257S773000, C257S786000, C257SE23142, C257SE23167

Reexamination Certificate

active

08004083

ABSTRACT:
An integrated circuit chip includes a silicon substrate, a first circuit in or over said silicon substrate, a second circuit device in or over said silicon substrate, a dielectric structure over said silicon substrate, a first interconnecting structure in said dielectric structure, a first pad connected to said first node of said voltage regulator through said first interconnecting structure, a second interconnecting structure in said dielectric structure, a second pad connected to said first node of said internal circuit through said second interconnecting structure, a passivation layer over said dielectric structure, wherein multiple opening in said passivation layer exposes said first and second pads, and a third interconnecting structure over said passivation layer and over said first and second pads.

REFERENCES:
patent: 4685998 (1987-08-01), Quinn
patent: 4789647 (1988-12-01), Peters
patent: 5046161 (1991-09-01), Takada
patent: 5061985 (1991-10-01), Meguro et al.
patent: 5083187 (1992-01-01), Lamson
patent: 5216380 (1993-06-01), Carbou
patent: 5226232 (1993-07-01), Boyd
patent: 5244833 (1993-09-01), Gansauge et al.
patent: 5291066 (1994-03-01), Neugebauer et al.
patent: 5384488 (1995-01-01), Golshan
patent: 5416661 (1995-05-01), Furuta
patent: 5468984 (1995-11-01), Efland
patent: 5532512 (1996-07-01), Fillion
patent: 5659201 (1997-08-01), Wollesen
patent: 5665989 (1997-09-01), Dangelo
patent: 5691248 (1997-11-01), Cronin
patent: 5767010 (1998-06-01), Mis et al.
patent: 5792594 (1998-08-01), Brown
patent: 5834844 (1998-11-01), Akagawa
patent: 5854513 (1998-12-01), Kim
patent: 5883435 (1999-03-01), Geffken
patent: 5892273 (1999-04-01), Iwasaki
patent: 5952726 (1999-09-01), Liang
patent: 5994766 (1999-11-01), Shenoy
patent: 6011314 (2000-01-01), Leibovitz
patent: 6022792 (2000-02-01), Ishii
patent: 6075290 (2000-06-01), Schaefer et al.
patent: 6077726 (2000-06-01), Mistry
patent: 6144100 (2000-11-01), Shen
patent: 6184143 (2001-02-01), Ohashi
patent: 6187680 (2001-02-01), Costrini
patent: 6288447 (2001-09-01), Amishiro
patent: 6348681 (2002-02-01), Kindt
patent: 6359328 (2002-03-01), Dubin
patent: 6362087 (2002-03-01), Wang
patent: 6383916 (2002-05-01), Lin
patent: 6399975 (2002-06-01), Cheong et al.
patent: 6429120 (2002-08-01), Ahn
patent: 6472745 (2002-10-01), Iizuka
patent: 6495442 (2002-12-01), Lin
patent: 6515373 (2003-02-01), Barth
patent: 6518092 (2003-02-01), Kikuchi
patent: 6578754 (2003-06-01), Tung
patent: 6605528 (2003-08-01), Lin et al.
patent: 6614091 (2003-09-01), Downey
patent: 6639299 (2003-10-01), Aoki
patent: RE38296 (2003-11-01), Moriuchi et al.
patent: 6646347 (2003-11-01), Mercado
patent: 6649509 (2003-11-01), Lin et al.
patent: 6653563 (2003-11-01), Bohr
patent: 6680544 (2004-01-01), Lu
patent: 6683380 (2004-01-01), Efland et al.
patent: 6693020 (2004-02-01), Mui
patent: 6707124 (2004-03-01), Wachtler
patent: 6756295 (2004-06-01), Lin
patent: 6762115 (2004-07-01), Lin
patent: 6780748 (2004-08-01), Yamaguchi
patent: 6861740 (2005-03-01), Hsu
patent: 6927156 (2005-08-01), Mathew
patent: 6943440 (2005-09-01), Kim
patent: 6963136 (2005-11-01), Shinozaki
patent: 7084507 (2006-08-01), Awano
patent: 7230340 (2007-06-01), Lin
patent: 7239028 (2007-07-01), Anzai
patent: 7271489 (2007-09-01), Lin
patent: 7319277 (2008-01-01), Lin
patent: 7372161 (2008-05-01), Lin et al.
patent: 7381642 (2008-06-01), Lin
patent: 7388240 (2008-06-01), Kim
patent: 7397121 (2008-07-01), Chou
patent: 7416971 (2008-08-01), Lin
patent: 7420276 (2008-09-01), Lin
patent: 7423346 (2008-09-01), Lin
patent: 7427560 (2008-09-01), Lin et al.
patent: 7452803 (2008-11-01), Lin
patent: 7465654 (2008-12-01), Chou
patent: 7468545 (2008-12-01), Lin
patent: 7470997 (2008-12-01), Lin
patent: 7473999 (2009-01-01), Lin
patent: 7511376 (2009-03-01), Lin et al.
patent: 7582556 (2009-09-01), Lin
patent: 2001/0000013 (2001-03-01), Lin
patent: 2001/0051426 (2001-12-01), Pozder
patent: 2002/0158334 (2002-10-01), Vu
patent: 2003/0200509 (2003-10-01), Takabayashi et al.
patent: 2003/0218246 (2003-11-01), Abe
patent: 2004/0023450 (2004-02-01), Katagiri
patent: 2004/0166659 (2004-08-01), Lin et al.
patent: 2004/0188841 (2004-09-01), Chen et al.
patent: 2004/0253804 (2004-12-01), Beica et al.
patent: 2005/0057963 (2005-03-01), Ogura et al.
patent: 2005/0104177 (2005-05-01), Lin et al.
patent: 2005/0280092 (2005-12-01), Cheng
patent: 2006/0014376 (2006-01-01), Agarwala
patent: 2006/0063378 (2006-03-01), Lin et al.
patent: 2006/0157856 (2006-07-01), Ichikawa et al.
patent: 2007/0082501 (2007-04-01), Hurwitz
patent: 2007/0164279 (2007-07-01), Lin
patent: 2007/0182521 (2007-08-01), Lin
patent: 2007/0205508 (2007-09-01), Hsia et al.
patent: 2007/0205520 (2007-09-01), Chou
patent: 2007/0275503 (2007-11-01), Lin
patent: 2008/0001290 (2008-01-01), Chou
patent: 2008/0006945 (2008-01-01), Lin
patent: 2008/0042280 (2008-02-01), Lin
patent: 2008/0079461 (2008-04-01), Lin et al.
patent: 2008/0080111 (2008-04-01), Lin et al.
patent: 2008/0080112 (2008-04-01), Lin et al.
patent: 2008/0080113 (2008-04-01), Lin et al.
patent: 2008/0081457 (2008-04-01), Lin et al.
patent: 2008/0081458 (2008-04-01), Lin et al.
patent: 2008/0111242 (2008-05-01), Lin et al.
patent: 2008/0159042 (2008-07-01), Bertin et al.
patent: 2008/0246154 (2008-10-01), Lin et al.
patent: 2008/0251925 (2008-10-01), Lin et al.
patent: 2009/0057895 (2009-03-01), Lin et al.
patent: 2009/0065871 (2009-03-01), Lin et al.
patent: 2009/0146307 (2009-06-01), Lin et al.
patent: 2009/0309224 (2009-12-01), Lin et al.
patent: 2010/0117236 (2010-05-01), Lin et al.
patent: 1855514 (2006-11-01), None
patent: 101231998 (2008-07-01), None
patent: 449882 (2001-08-01), None
patent: 249822 (2006-02-01), None
Taiwan Search Report for Taiwan Patent Application No. 095136115 dated Oct. 10, 2009 with English Translation Summary.
Mistry, K. et al. “A 45nm Logic Technology with High-k+ Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging,” IEEE International Electron Devices Meeting (2007) pp. 247-250.
Edelstein, D.C., “Advantages of Copper Interconnects,” Proceedings of the 12th International IEEE VLSI Multilevel Interconnection Conference (1995) pp. 301-307.
Theng, C. et al. “An Automated Tool Deployment for ESD (Electro-Static-Discharge) Correct-by-Construction Strategy in 90 nm Process,” IEEE International Conference on Semiconductor Electronics (2004) pp. 61-67.
Gao, X. et al. “An improved electrostatic discharge protection structure for reducing triggering voltage and parasitic capacitance,” Solid-State Electronics, 27 (2003), pp. 1105-1110.
Yeoh, A. et al. “Copper Die Bumps (First Level Interconnect) and Low-K Dielectrics in 65nm High Volume Manufacturing,” Electronic Components and Technology Conference (2006) pp. 1611-1615.
Hu, C-K. et al. “Copper-Polyimide Wiring Technology for VLSI Circuits,” Materials Research Society Symposium Proceedings VLSI V (1990) pp. 369-373.
Roesch, W. et al. “Cycling copper flip chip interconnects,” Microelectronics Reliability, 44 (2004) pp. 1047-1054.
Lee, Y-H. et al. “Effect of ESD Layout on the Assembly Yield and Reliability,” International Electron Devices Meeting (2006) pp. 1-4.
Yeoh, T-S, “ESD Effects On Power Supply Clamps,” Proceedings of the 6th International Sympoisum on Physical & Failure Analysis of Integrated Circuits (1997) pp. 121-124.
Edelstein, D. et al. “Full Copper Wiring in a Sub-0.25 pm CMOS ULSI Technology, ” Technical Digest IEEE International Electron Devices Meeting (1997) pp. 773-776.
Venkatesan, S. et al. “A High Performance 1.8V, 0.20 pm CMOS Technology with Copper Metallization, ” Technical Digest IEEE International Electron Devices Meeting (1997) pp. 769-772.
Jenei, S. et al. “High Q Inductor Add-on Module in Thick Cu/SiLK™ single damascene,” Proceedings from the IEEE International Interconnect Technology Conference (2001) pp. 107-109.
Groves, R. et al. “High Q Inductors in

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Integrated circuit chips with fine-line metal and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated circuit chips with fine-line metal and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated circuit chips with fine-line metal and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2736228

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.