Integral plated resistor and method for the manufacture of...

Details Integral plated resistor and method for the manufacture of... Integral plated resistor and method for the manufacture of...

2006-04-04

2006-04-04

Barreca, Nicole (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S311000, C430S313000, C427S099500, C427S126600

Reexamination Certificate

active

07022464

ABSTRACT:
An integral plated resistor having an improved range of resistance is produced by uniformly dispersing an effective amount of various particles in an electroless nickel phosphorus plating composition so that the particles are codeposited with the electroless nickel phosphorus plating composition. Preferred particles include, polytetrafluoroethylene, silicon carbide, tungsten carbide, and other particles that fully sinter at a temperature of less than about 170° C. The improved nickel phosphorus plated resistors of the invention demonstrate increased stability during manufacturing press cycles and a greater range of resistance values than have previously been achieved.

REFERENCES:
patent: 6281090 (2001-08-01), Kukanskis et al.
patent: 6440318 (2002-08-01), Lee et al.
patent: 6610417 (2003-08-01), Andresakis et al.
patent: 6680441 (2004-01-01), Kondo et al.
patent: 6767445 (2004-07-01), Kukanskis et al.
patent: 2003/0112110 (2003-06-01), Pavier
patent: 2003/0161959 (2003-08-01), Kodas et al.
patent: 2003/0231099 (2003-12-01), Schemenaur et al.
patent: WO 89/02212 (1989-09-01), None

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