Insulation-film etching system

Details Insulation-film etching system Insulation-film etching system

2006-04-11

2006-04-11

Lund, Jeffrie R. (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With heating or cooling means for apparatus part other than...

C156S345290, C156S345470

Reexamination Certificate

active

07025855

ABSTRACT:
This application discloses an insulation-film etching system that etches an insulator film on a substrate by a species produced in plasma. The apparatus comprises a process chamber in which the etching process is carried out, a substrate holder that is provided in the process chamber and holds the substrate, a gas introduction line to introduce a gas having an etching function into the process chamber, a plasma generator to generate the plasma of the introduced gas, and a transfer mechanism to transfer the substrate into the process chamber and to transfer the substrate out of the process chamber. The gas introduction line is capable of introducing a gas having a cleaning function to remove a deposited film on an exposed surface in the process chamber, instead of the gas for the etching. The system comprises a control unit that carries out the sequence control. According as the sequence control, the cleaning is carried out after the etching.

REFERENCES:
patent: 4624214 (1986-11-01), Suzuki et al.
patent: 5064520 (1991-11-01), Miyake et al.
patent: 5474647 (1995-12-01), Poultney et al.
patent: 5622918 (1997-04-01), Nakamura
patent: 5685942 (1997-11-01), Ishii
patent: 5709757 (1998-01-01), Hatano et al.
patent: 5711813 (1998-01-01), Kadoiwa et al.
patent: 6318384 (2001-11-01), Khan et al.
patent: 6403491 (2002-06-01), Liu et al.
patent: 6649021 (2003-11-01), Ohmoto et al.
patent: 2002/0117472 (2002-08-01), Sun et al
patent: 2003/0159779 (2003-08-01), Sago et al.
patent: 55-046576 (1980-04-01), None
patent: 59-050179 (1984-03-01), None
patent: 05-243190 (1993-09-01), None
patent: 06-310588 (1994-11-01), None
patent: 07-331462 (1995-12-01), None
patent: 08-176828 (1996-07-01), None
patent: 08-288267 (1996-11-01), None
patent: 10-112457 (1998-04-01), None
patent: 10-144498 (1998-05-01), None
patent: 10-154696 (1998-06-01), None
patent: 10-178003 (1998-06-01), None
patent: 11-040502 (1999-02-01), None
patent: 11-121436 (1999-04-01), None
patent: 11-186226 (1999-07-01), None
patent: 11-233487 (1999-08-01), None
patent: 11-340215 (1999-12-01), None
Machine translation of JP 05-243190.
Machine translation of JP 06-310588.

Affiliated with

Also associated with

Rating

Insulation-film etching system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Insulation-film etching system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Insulation-film etching system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3587209