Insulating tube, semiconductor device employing the tube,...

Details Insulating tube, semiconductor device employing the tube,... Insulating tube, semiconductor device employing the tube,...

2007-10-16

2007-10-16

Quach, T. N. (Department: 2826)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S639000, C438S745000, C257SE21576

Reexamination Certificate

active

11244293

ABSTRACT:
An insulating tube includes a underlying insulating film, a first sidewall insulating film disposed on the underlying insulating film, a second sidewall insulating film disposed on the underlying insulating film, opposite to the first sidewall insulating film so as to provide a cavity between the first and second sidewall insulating films having the same height as the first sidewall insulating film, and an upper insulating film provided over the first and second sidewall insulating films.

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Notification of Reasons for Refusal issued by the Japanese Patent Office on Feb. 20, 2007, for Japanese Patent Application No. 2003-202486, and English-language translation thereof.

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