Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Combined with the removal of material by nonchemical means
Reexamination Certificate
2006-11-14
2006-11-14
Parekh, Nitin (Department: 2811)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Combined with the removal of material by nonchemical means
C438S758000, C438S329000, C438S107000, C438S508000
Reexamination Certificate
active
07135415
ABSTRACT:
An insulated structure of a chip array component and fabrication method of the same, the element is fabricated by enclosing its main body with a dense layer of high surface insulation resistance material, and then exposing the portions of the main body where terminal electrodes are to be formed by removing the dense layer of high surface insulation resistance material by employing sand blasting, laser trimming, grinding, or etching process.
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Chen Ching-Chien
Hsu Yu-Chin
Ku Kwo-Fang
Kuo Hsiao-Lin
Inpaq Technology Co. Ltd.
Lowe Hauptman & Berner LLP
Parekh Nitin
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