Insulated gate bipolar transistor having a trench and a method f

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

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257144, 257622, 257 77, H01L 2974

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active

057639027

ABSTRACT:
An insulated gate bipolar transistor comprises a drain which supports a highly doped p-type substrate layer; a low doped n-type drift layer supported over the substrate layer; a base layer supported over the drift layer including a trench extending into the base layer, and supporting an insulated gate on an upper surface thereof separated from the trench by a highly doped n-type source region, the trench having a highly doped p-type layer at the bottom thereof vertically separated from the source region; and a source layer disposed over the n-type source region and extending into the trench covering the highly doped p-type layer in the trench bottom, wherein an applied voltage to the gate forms a conducting inversion channel in the base layer for electron transport from the source region to the drain, and the highly doped p-type layer in the bottom of the trench collects holes injected from the substrate layer into the drift layer thereby improving latch up immunity for the transistor.

REFERENCES:
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patent: 5079602 (1992-01-01), Harada
patent: 5173435 (1992-12-01), Harada
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patent: 5396087 (1995-03-01), Baliga
patent: 5397717 (1995-03-01), Davis et al.
patent: 5506421 (1996-04-01), Palmour
Baliga et al., Gate Turn-Off Capability of Depletion-Mode Thyristors, IEEE Electron Device Letters, vol. 10, No. 10, Oct. 1989, pp. 464-466.
Nishizawa et al., A Low-Loss High-Speed Switching Device: The 2500-V 300-A Static Induction Thyristor, IEEE Transactions on Electron Devices, vol. ED-33, No. 4, Apr. 1986, pp. 507-515.

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