Insulated gate bipolar transistor device comprising a...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S122000, C257S133000, C257S138000, C257S139000, C257S146000, C257S147000, C257S263000, C257S328000, C257S329000, C257S330000, C257S331000, C257S341000, C257S370000, C257S392000, C257SE21382, C257SE21383, C257SE27020, C257SE27036, C257SE27054, C257SE27061, C257SE27064, C257SE29027, C257SE29066, C257SE29183, C257SE29197, C257SE29198

Reexamination Certificate

active

07968940

ABSTRACT:
Double gate IGBT having both gates referred to a cathode in which a second gate is for controlling flow of hole current. In on-state, hole current can be largely suppressed. While during switching, hole current is allowed to flow through a second channel. Incorporating a depletion-mode p-channel MOSFET having a pre-formed hole channel that is turned ON when 0V or positive voltages below a specified threshold voltage are applied between second gate and cathode, negative voltages to the gate of p-channel are not used. Providing active control of holes amount that is collected in on-state by lowering base transport factor through increasing doping and width of n well or by reducing injection efficiency through decreasing doping of deep p well. Device includes at least anode, cathode, semiconductor substrate, n− drift region, first & second gates, n+ cathode region; p+ cathode short, deep p well, n well, and pre-formed hole channel.

REFERENCES:
patent: 5554862 (1996-09-01), Omura
patent: 5689121 (1997-11-01), Kitagawa
patent: 5838026 (1998-11-01), Kitagawa
patent: 5861638 (1999-01-01), Oh
patent: 6236069 (2001-05-01), Shinohe et al.
patent: 6809349 (2004-10-01), Yamaguchi
patent: 7170106 (2007-01-01), Yamaguchi

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