Installation to supply gas

Details Installation to supply gas Installation to supply gas

1998-11-13

2000-02-29

Bueker, Richard

Coating apparatus

Condition responsive control

118715, 118723E, 156345, C23C 1600

Patent

active

060304561

ABSTRACT:
An installation can adjust gas supply in a reaction chamber according to the conditions in the reaction chamber. The installation comprises sensors, a gas-supplying panel and a driving device. The sensors are located in the reaction chamber to sense the conditions in the reaction chamber. The gas-supplying panel has a plurality of apertures, which are asymmetrically located, through which apertures gas is supplied. The driving device, coupled to the sensors and the gas-supplying panel, drives the gas-supplying panel to respond to the conditions sensed by the sensors, in which the gas-supplying panel can adjust the positions of the gas supplied through the apertures.

REFERENCES:
patent: 5552017 (1996-09-01), Jang

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