Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-07-15
2008-07-15
Connolly, Patrick (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07400390
ABSTRACT:
A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.
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Elyasaf Emanuel
Goldenshtein Alex
Applied Materials Israel, Ltd.
Connolly Patrick
Fahmi Tarek N.
Skovholt Jonathan
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