Inspection system and a method for aerial reticle inspection

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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Reexamination Certificate

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07400390

ABSTRACT:
A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.

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