Image analysis – Histogram processing – For setting a threshold
Patent
1990-09-24
1992-06-23
Moore, David K.
Image analysis
Histogram processing
For setting a threshold
382 8, 382 48, 358101, G06K 968
Patent
active
051250403
ABSTRACT:
A method of inspecting a photomask reticle for the fabrication of a semiconductor device such as a die having a first pattern which has its own individual shape and a plurality of second patterns each having the same shape and size among themselves, combining the methods of the database inspection and of the pattern comparing inspection. The method of database inspection is applied to the first pattern and to one of the second patterns selected randomly. The database inspection can be performed by comparison with inspection data derived from design data used for the fabrication of the photomask reticle, such as by an improved reticle tester which can exclude all of the second patterns except the selected one of the second patterns. The second patterns other than the selected pattern are then inspected by the method of the pattern comparing inspection, that is, by comparison with the selected second pattern which has already been inspected by the database inspection. The volume of the storage for the inspection data and the time required to inspect the photomask reticle can be reduced to less than one fourth of those in the prior art inspection method, while maintaining high accuracy in the inspection of photomask reticles.
REFERENCES:
patent: 4056716 (1977-11-01), Baxter et al.
patent: 4242662 (1980-12-01), Tsujiyama et al.
patent: 4441207 (1984-04-01), Lougheed et al.
patent: 4448532 (1984-05-01), Joseph et al.
patent: 4477926 (1984-10-01), Linger et al.
patent: 4491962 (1985-01-01), Sakou et al.
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4543660 (1985-09-01), Maeda
patent: 4555798 (1985-11-01), Broadbent, Jr. et al.
patent: 4570180 (1986-02-01), Baier et al.
patent: 4579455 (1986-04-01), Levy et al.
patent: 4589139 (1986-05-01), Hada et al.
Review of the Electrical Communications Laboratories, vol. 30, No. 6, 1982, pp. 1076-1085, Tokyo, JP; B. Tsujiyama et al.: "An automated mask defect inspection".
Kobayashi Ken-ichi
Matsui Shogo
Couso Jose L.
Fujitsu Ltd.
Moore David K.
LandOfFree
Inspection method of photomask reticle for semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Inspection method of photomask reticle for semiconductor device , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection method of photomask reticle for semiconductor device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-939829