Inspection method for semiconductor wafer and apparatus for...

Details Inspection method for semiconductor wafer and apparatus for... Inspection method for semiconductor wafer and apparatus for...

2006-12-04

2009-02-03

Vanore, David A. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

C250S307000, C250S310000, C250S311000, C250S442110, C250S492200

Reexamination Certificate

active

07485858

ABSTRACT:
An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.

REFERENCES:
patent: 5801965 (1998-09-01), Takagi et al.
patent: 6259960 (2001-07-01), Inokuchi
patent: 6438438 (2002-08-01), Takagi et al.
patent: 6546308 (2003-04-01), Takagi et al.
patent: 6756589 (2004-06-01), Obara et al.
patent: 2001/0020194 (2001-09-01), Takagi et al.
patent: 2005/0024632 (2005-02-01), Plemmons et al.
patent: 2007/0127016 (2007-06-01), Meeks et al.
patent: 7-201946 (1995-08-01), None
patent: 2000-30652 (2000-01-01), None
patent: WO 00/03413 (2000-01-01), None

Affiliated with

Also associated with

Rating

Inspection method for semiconductor wafer and apparatus for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inspection method for semiconductor wafer and apparatus for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection method for semiconductor wafer and apparatus for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4119769