Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate
2011-01-11
2011-01-11
Bhat, Aditya (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Quality evaluation
Reexamination Certificate
active
07869966
ABSTRACT:
The present invention relates to a tool for analyzing by priority a defect having a high possibility of causing an electrical failure when inspecting a particle and a pattern defect in a piece of work which constitutes an electronic device such as a semiconductor integrated circuit, and relates to a system therefor. On the basis of the result of comparison between defect information which is the result of inspection by an inspection tool and layout data stored in an auxiliary storage device, or on the basis of the result of reinspection by comparison between a defect and a wiring pattern as a background by an inspection processing operation unit, an object to be reviewed is selected using review conditions stored in the auxiliary storage device.
REFERENCES:
patent: 4226539 (1980-10-01), Nakagawa et al.
patent: 4559603 (1985-12-01), Yoshikawa
patent: 4803734 (1989-02-01), Onishi et al.
patent: 4996434 (1991-02-01), Tanaka
patent: 5214712 (1993-05-01), Yamamoto et al.
patent: 5680207 (1997-10-01), Hagiwara
patent: 6185707 (2001-02-01), Smith et al.
patent: 6334097 (2001-12-01), Yoshitake et al.
patent: 6347150 (2002-02-01), Hiroi et al.
patent: 6400839 (2002-06-01), Takayama
patent: 6456951 (2002-09-01), Maeda et al.
patent: 6614022 (2003-09-01), Hiroi et al.
patent: 6629051 (2003-09-01), Tanaka
patent: 6973209 (2005-12-01), Tanaka
patent: 6987873 (2006-01-01), Ben-Porath et al.
patent: 7283659 (2007-10-01), Bakker et al.
patent: 2002/0052053 (2002-05-01), Ono et al.
patent: 2002/0094120 (2002-07-01), Hiroi et al.
patent: 2003/0093767 (2003-05-01), Murai et al.
patent: 2003/0195712 (2003-10-01), Ono et al.
patent: 2004/0028272 (2004-02-01), Hiroi et al.
patent: 57044838 (1982-03-01), None
patent: 10-214868 (1998-08-01), None
patent: 2000-88583 (2000-03-01), None
patent: 2000-294611 (2000-10-01), None
patent: 2000-306964 (2000-11-01), None
patent: 2001-230289 (2001-08-01), None
Maeda Shunji
Okabe Takafumi
Sakai Kaoru
Antonelli, Terry Stout & Kraus, LLP.
Bhat Aditya
Hitachi , Ltd.
LandOfFree
Inspection method and its apparatus, inspection system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Inspection method and its apparatus, inspection system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection method and its apparatus, inspection system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2702395