Inspection method and apparatus using charged particle beam

Details Inspection method and apparatus using charged particle beam Inspection method and apparatus using charged particle beam

2006-03-28

2006-03-28

Lee, John R. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron microscope type

C250S306000, C250S307000, C250S309000, C250S310000

Reexamination Certificate

active

07019294

ABSTRACT:
Inspection method and apparatus using a charged particle beam for the inspection of defects on an unfinished semiconductor wafer in the manufacturing process of a semiconductor device, a uniform charge across the wafer is attained by performing ultraviolet irradiation and voltage application to a charge control electrode in a coordinated manner.

REFERENCES:
patent: 2002/0130262 (2002-09-01), Nakasuji et al.
patent: 2005/0174140 (2005-08-01), Iwasaki
patent: 2005/0190310 (2005-09-01), Koyama et al.
patent: 06-338280 (1994-12-01), None
patent: 11-121561 (1999-04-01), None
patent: 2000-208085 (2000-07-01), None
patent: 2002-270655 (2002-09-01), None
patent: 2003-151483 (2003-05-01), None

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