Inspection method and apparatus, lithographic apparatus,...

Details Inspection method and apparatus, lithographic apparatus,... Inspection method and apparatus, lithographic apparatus,...

2007-03-07

2009-10-06

Lauchman, L. G (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S635000, C356S601000, C356S445000, C257S787000, C430S005000, C430S022000

Reexamination Certificate

active

07599064

ABSTRACT:
An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between X and Y overlay measurements can therefore be avoided. The gratings may be directly overlying or off set so as to be interleaved in one or two directions.

REFERENCES:
patent: 5506684 (1996-04-01), Ota et al.
patent: 5689339 (1997-11-01), Ota et al.
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5880838 (1999-03-01), Marx et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6153886 (2000-11-01), Hagiwara et al.
patent: 6608690 (2003-08-01), Niu et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6738138 (2004-05-01), Wei
patent: 6753961 (2004-06-01), Norton et al.
patent: 6768983 (2004-07-01), Jakatdar et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6856408 (2005-02-01), Raymond
patent: 6919964 (2005-07-01), Chu
patent: 6927004 (2005-08-01), Eurlings et al.
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6972852 (2005-12-01), Opsal et al.
patent: 6974962 (2005-12-01), Brill et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061623 (2006-06-01), Davidson
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7068363 (2006-06-01), Bevis et al.
patent: 7283236 (2007-10-01), Presura et al.
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2006/0033921 (2006-02-01), Den Boef et al.
patent: 2006/0066855 (2006-03-01), Den Boef et al.
patent: 2006/0126074 (2006-06-01), Van Der Werf et al.
patent: 2006/0139592 (2006-06-01), Den Boef et al.
patent: 1 628 164 (2006-02-01), None
patent: 1 628 164 (2006-04-01), None

Affiliated with

Also associated with

Rating

Inspection method and apparatus, lithographic apparatus,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inspection method and apparatus, lithographic apparatus,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inspection method and apparatus, lithographic apparatus,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4139362