Optics: measuring and testing – By alignment in lateral direction
Reexamination Certificate
2011-03-22
2011-03-22
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
C356S401000, C430S022000, C430S030000, C438S401000
Reexamination Certificate
active
07911612
ABSTRACT:
An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every nthstructure is different from the rest of the structures. The periodic array is desirably made of two interlaced gratings, one of the gratings having a different pitch from the other grating in order to create an asymmetry in the array. This asymmetry can then be measured by measuring the diffraction spectra of radiation reflected from the overlay target. Variation in the asymmetry indicates the presence of an overlay error in layers on the substrate, where overlay targets are printed on subsequent layers.
REFERENCES:
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5880838 (1999-03-01), Marx et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6433878 (2002-08-01), Niu et al.
patent: 6608690 (2003-08-01), Niu et al.
patent: 6699624 (2004-03-01), Niu et al.
patent: 6704661 (2004-03-01), Opsal et al.
patent: 6721691 (2004-04-01), Bao et al.
patent: 6738138 (2004-05-01), Wei
patent: 6753961 (2004-06-01), Norton et al.
patent: 6765282 (2004-07-01), Schulz
patent: 6767680 (2004-07-01), Schulz
patent: 6768983 (2004-07-01), Jakatdar et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6804005 (2004-10-01), Bischoff et al.
patent: 6813034 (2004-11-01), Rosencwaig et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6855464 (2005-02-01), Niu et al.
patent: 6856408 (2005-02-01), Raymond
patent: 6919964 (2005-07-01), Chu
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6972852 (2005-12-01), Opsal et al.
patent: 6974962 (2005-12-01), Brill et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7046376 (2006-05-01), Sezginer
patent: 7061615 (2006-06-01), Lowe-Webb
patent: 7061623 (2006-06-01), Davidson
patent: 7061627 (2006-06-01), Opsal et al.
patent: 7068363 (2006-06-01), Bevis et al.
patent: 7075639 (2006-07-01), Adel et al.
patent: 7099010 (2006-08-01), Schulz
patent: 7151594 (2006-12-01), Den Boef et al.
patent: 7403259 (2008-07-01), Kruijswijk et al.
patent: 7481579 (2009-01-01), Yokhin et al.
patent: 7528931 (2009-05-01), Modderman
patent: 7616313 (2009-11-01), Kandel et al.
patent: 7656528 (2010-02-01), Abdulhalim et al.
patent: 7663753 (2010-02-01), Mieher et al.
patent: 2003/0044702 (2003-03-01), Schulz
patent: 2004/0061857 (2004-04-01), Abdulhalim et al.
patent: 2004/0109165 (2004-06-01), Fay et al.
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2004/0137341 (2004-07-01), Niu et al.
patent: 2006/0033921 (2006-02-01), Den Boef et al.
patent: 2006/0066855 (2006-03-01), Den Boef et al.
patent: 2006/0126074 (2006-06-01), Van Der Werf et al.
patent: 2006/0139592 (2006-06-01), Den Boef et al.
patent: 2008/0002213 (2008-01-01), Weiss
patent: 2008/0239318 (2008-10-01), Den Boef et al.
patent: 2001-093820 (2001-04-01), None
patent: 2002-311564 (2002-10-01), None
patent: 2003-068639 (2003-03-01), None
patent: 2004-200680 (2004-07-01), None
patent: 2004-519716 (2004-07-01), None
patent: 2004-533114 (2004-10-01), None
patent: 2005-142576 (2005-06-01), None
patent: 2006-179906 (2006-07-01), None
patent: 2007-305971 (2007-11-01), None
patent: 2009-532862 (2009-09-01), None
patent: 2005110467 (2005-11-01), None
“Interferometric Method of Checking the Overlay Accuracy in Photolitho Graphic Exposure Processes,” Mar. 1, 1990, IBM Technical Disclosure Bulletin, vol. 32, Issue No. 10B, pp. 214-217.
English Language Abstract for JP 2001-093820 A, published Apr. 6, 2001; 1 page.
English Language Abstract for JP 2002-311564 A, published Oct. 23, 2002; 1 page.
English Language Description and Claims for JP 2004-519716 A, published Jul. 2, 2004; 5 pages.
English Language Abstract for JP 2004-200680 A, published Jul. 15, 2004; 1 page.
English Language Abstract for JP 2005-142576 A, published Jun. 2, 2005; 1 page.
English Language Abstract for JP 2006-179906 A, published Jul. 6, 2006; 1 page.
English Language Abstract for JP 2007-305971 A, published Nov. 22, 2007; 1 page.
English Translation of Notice of Reasons for Rejection directed to related Japanese Patent application No. 2008-148757, mailed on Jan. 5, 2011, from the Japanese Patent Office; 4 pages.
Den Boef Arie Jeffrey
Kiers Antoine Gaston Marie
Van Der Schaar Maurits
ASML Netherlands B.V.
Chowdhury Tarifur
Sterne Kessler Goldstein & Fox P.L.L.C.
Stock, Jr. Gordon J
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