Inspection method and a photomask

Details Inspection method and a photomask Inspection method and a photomask

2007-03-06

2007-03-06

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C382S145000

Reexamination Certificate

active

10615228

ABSTRACT:
An inspection method, includes obtaining a first optical characteristic of a projection optical system by transferring an image of an aberration measurement unit of a photomask on a first resist film coated on a first wafer by use of a first polarized exposure light; obtaining a second optical characteristic of the projection optical system by transferring the image of the aberration measurement unit on a second resist film coated on a second wafer by use of a second exposure light having a polarization state different from the first exposure light; and calculating a difference between the first and second optical characteristics.

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patent: 6-181167 (1994-06-01), None
Hiroshi Nomura, Investigation of High-Precision Lithography Lens Aberration Measurement Based on Three-Beam Interference Theory: Sensitivity versus Coherent Factor and Variations with Dose and Focus, Optical Review, vol. 7, No. 6 (Jul. 2000), pp. 525-534.
Search Report issued by Netherlands Patent Office for Netherlands Application No. 135218, dated Jul. 26, 2005.

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